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admin2010-08-26 08:47:362020-08-01 17:51:32Limits on vanadium oxide Mott metal-insulator transition field effect transistors, S. Hormoz and S. Ramanathan, Solid State Electronics, 54, 654, 2010
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admin2009-08-26 09:50:322020-08-01 17:51:33Studies on sub-100nm Fluorite-Derivative Oxide Films: Structural Evolution, Electrical Properties and Photon Effects, Masaru Tsuchiya, Harvard University, 2009
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admin2009-08-26 08:46:432020-08-01 17:51:33Photon-assisted oxidation and oxide synthesis: A review, M. Tsuchiya, K.R.S.S. Sankaranarayanan and S. Ramanathan, Progress in Materials Science, 54, 981 (2009)
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admin2009-08-26 08:46:012020-08-01 17:51:33Atomistic simulations of field enhanced oxidation of Al (100) beyond the Mott potential, S. K.R. S. Sankaranarayanan, E. Kaxiras and S. Ramanathan, Physical Review Letters, 102, 095504 (2009)
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admin2009-08-26 08:43:532020-08-01 17:51:33Carrier density and magneto-resistance measurements on vanadium oxide thin films across the phase transition boundary, D. Ruzmetov, D. Heiman, B. Claflin, V. Narayanamurti and S. Ramanathan, Physical Review B, 75, 153107 (2009)
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admin2009-08-26 08:43:062020-08-01 17:51:33An experimental investigation into micro-fabricated fuel cells utilizing ultra-thin LaSrCoFeO3 cathodes and yttria-doped zirconia electrolyte films, A.C. Johnson, B.K. Lai, H. Xiong and S. Ramanathan, Journal of Power Sources, 186, 252 (2009)
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admin2008-08-26 08:41:242020-08-01 17:51:33An investigation into photon irradiation induced structural and interfacial phenomena in pure and alio-valently doped zirconia thin films, M. Tsuchiya and S. Ramanathan, Philosophical Magazine, 88, 2519 (2008)
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admin2007-08-26 08:40:442020-08-01 17:51:34X-ray absorption spectroscopy studies of vanadium oxide thin films across the phase transition boundary, D. Ruzmetov, S. Senanayake and S. Ramanathan, Physical Review B, 75, 195102 (2007)
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admin2006-08-26 08:38:392020-08-01 17:51:34Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65 nm strained Si/low-k CMOS tchnology, P. Morrow, C. M. Park, S. Ramanathan, M. Kobrinsky and M. Harmes, IEEE Electron Device Letters, 27, 335 (2006)
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admin2004-08-26 08:37:372020-08-01 17:51:34Charge-trapping studies in ZrO2 and HfO2 gate dielectrics grown by ultra-violet ozone oxidation, S. Ramanathan, P.C. McIntyre, S. Guha and E.P. Gusev, Applied Physics Letters, 84, 389 (2004)
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