Photon-assisted oxidation and oxide synthesis: A review, M. Tsuchiya, K.R.S.S. Sankaranarayanan and S. Ramanathan, Progress in Materials Science, 54, 981 (2009)

Atomistic simulations of field enhanced oxidation of Al (100) beyond the Mott potential, S. K.R. S. Sankaranarayanan, E. Kaxiras and S. Ramanathan, Physical Review Letters, 102, 095504 (2009)

Carrier density and magneto-resistance measurements on vanadium oxide thin films across the phase transition boundary, D. Ruzmetov, D. Heiman, B. Claflin, V. Narayanamurti and S. Ramanathan, Physical Review B, 75, 153107 (2009)

An experimental investigation into micro-fabricated fuel cells utilizing ultra-thin LaSrCoFeO3 cathodes and yttria-doped zirconia electrolyte films, A.C. Johnson, B.K. Lai, H. Xiong and S. Ramanathan, Journal of Power Sources, 186, 252 (2009)

An investigation into photon irradiation induced structural and interfacial phenomena in pure and alio-valently doped zirconia thin films, M. Tsuchiya and S. Ramanathan, Philosophical Magazine, 88, 2519 (2008)

X-ray absorption spectroscopy studies of vanadium oxide thin films across the phase transition boundary, D. Ruzmetov, S. Senanayake and S. Ramanathan, Physical Review B, 75, 195102 (2007)

Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65 nm strained Si/low-k CMOS tchnology, P. Morrow, C. M. Park, S. Ramanathan, M. Kobrinsky and M. Harmes, IEEE Electron Device Letters, 27, 335 (2006)

Charge-trapping studies in ZrO2 and HfO2 gate dielectrics grown by ultra-violet ozone oxidation, S. Ramanathan, P.C. McIntyre, S. Guha and E.P. Gusev, Applied Physics Letters, 84, 389 (2004)

Phase separation in hafnium silicates for alternative gate dielectrics, S. Ramanathan, P. C. McIntyre, J. Luning, P.S. Lysaght, Y. Yang, Z. Chen and S. Stemmer, Journal of Electrochemical Society, 150, F173 (2003)

Germanium MOS capacitors incorporating ultra-thin high-k dielectric, C.O. Chui, S. Ramanathan, B. Triplett, P.C. McIntyre and K.C. Saraswat, IEEE Electron Device Letters, 23, 473 (2002).