Charge-trapping studies in ZrO2 and HfO2 gate dielectrics grown by ultra-violet ozone oxidation, S. Ramanathan, P.C. McIntyre, S. Guha and E.P. Gusev, Applied Physics Letters, 84, 389 (2004)

Phase separation in hafnium silicates for alternative gate dielectrics, S. Ramanathan, P. C. McIntyre, J. Luning, P.S. Lysaght, Y. Yang, Z. Chen and S. Stemmer, Journal of Electrochemical Society, 150, F173 (2003)

Germanium MOS capacitors incorporating ultra-thin high-k dielectric, C.O. Chui, S. Ramanathan, B. Triplett, P.C. McIntyre and K.C. Saraswat, IEEE Electron Device Letters, 23, 473 (2002).

Microstructural study of epitaxial Pt films and permalloy / Pt films on (0001) Sapphire, S. Ramanathan, B.M. Clemens, P.C. McIntyre and U. Dahmen, Philosophical Magazine A, 81, 2073-2094 (2001).