https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2009-08-26 08:43:062020-08-01 17:51:33An experimental investigation into micro-fabricated fuel cells utilizing ultra-thin LaSrCoFeO3 cathodes and yttria-doped zirconia electrolyte films, A.C. Johnson, B.K. Lai, H. Xiong and S. Ramanathan, Journal of Power Sources, 186, 252 (2009)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2008-08-26 08:41:242020-08-01 17:51:33An investigation into photon irradiation induced structural and interfacial phenomena in pure and alio-valently doped zirconia thin films, M. Tsuchiya and S. Ramanathan, Philosophical Magazine, 88, 2519 (2008)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2007-08-26 08:40:442020-08-01 17:51:34X-ray absorption spectroscopy studies of vanadium oxide thin films across the phase transition boundary, D. Ruzmetov, S. Senanayake and S. Ramanathan, Physical Review B, 75, 195102 (2007)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2006-08-26 08:38:392020-08-01 17:51:34Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65 nm strained Si/low-k CMOS tchnology, P. Morrow, C. M. Park, S. Ramanathan, M. Kobrinsky and M. Harmes, IEEE Electron Device Letters, 27, 335 (2006)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2004-08-26 08:37:372020-08-01 17:51:34Charge-trapping studies in ZrO2 and HfO2 gate dielectrics grown by ultra-violet ozone oxidation, S. Ramanathan, P.C. McIntyre, S. Guha and E.P. Gusev, Applied Physics Letters, 84, 389 (2004)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2003-08-26 08:36:102020-08-01 17:51:34Phase separation in hafnium silicates for alternative gate dielectrics, S. Ramanathan, P. C. McIntyre, J. Luning, P.S. Lysaght, Y. Yang, Z. Chen and S. Stemmer, Journal of Electrochemical Society, 150, F173 (2003)
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2002-08-26 08:35:042020-08-01 17:51:34Germanium MOS capacitors incorporating ultra-thin high-k dielectric, C.O. Chui, S. Ramanathan, B. Triplett, P.C. McIntyre and K.C. Saraswat, IEEE Electron Device Letters, 23, 473 (2002).
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
0
0
admin
https://shriram-ramanathan.org/wp-content/uploads/2022/09/Rutgers_1-300x105.jpg
admin2001-08-26 08:32:412020-08-01 17:51:34Microstructural study of epitaxial Pt films and permalloy / Pt films on (0001) Sapphire, S. Ramanathan, B.M. Clemens, P.C. McIntyre and U. Dahmen, Philosophical Magazine A, 81, 2073-2094 (2001).
Scroll to top